Sheet Resistance Measurement Systems
Sheet Resistance Measurement Systems
Sheet resistance monitoring is critical to any industry that utilizes conductive films, from semiconductor manufacturing to the flexible electronics required to enable wearable technology. The Filmetrics® R-series sheet resistance measurement instruments have been developed based on over 45 years of KLA sheet resistance measurement innovation. Since the introduction of our first resistivity gauge in 1975, we have revolutionized both sheet resistance measurement and thickness measurement for conductive layers. The R50 measures metal layer thickness, sheet resistance and sheet conductance. The R54 – the latest innovation in KLA sheet resistance and conductivity mapping systems, adds a light-tight enclosure along with 300mm support, to provide metal thickness measurement solutions for semiconductor and compound semiconductor manufacturing.
Upcoming Event
View AllEPFL – MicroNanoFabrication Annual Review Meeting
KLA is exhibiting at EPFL – MicroNanoFabrication Annual Review Meeting. We invite you to visit our booth to learn more about our nanoindenter systems.
| Event Date | May 13, 2025 |
| Location | SwissTech Convention Center, Ecublens, Switzerland |
Filmetrics® R50-4PP Four-Point Probe System and Filmetrics R50-EC Eddy Current System
The Filmetrics R50-4PP contact four-point probe systems and Filmetrics R50-EC non-contact eddy current systems map metal layer thickness, sheet resistance, sheet resistivity, sheet conductance, and sheet conductivity.
A large Z range makes the R50-4PP ideal for a wide variety of applications. The R50-EC system is ideal for measuring resistance and film thickness on sensitive and/or flexible conductive surfaces.
Filmetrics® R54-200 and Filmetrics R54-300 Sheet Resistance Mapping Systems
The Filmetrics R54 advanced sheet resistance and conductivity mapping systems deliver R50 performance capability within a light-tight enclosure with additional capability to support semiconductor and compound semiconductor applications, including implant and epitaxial wafers.
The two R54 systems, accommodating upto 200mm and 300mm sample options, can be configured as either direct four-point probe (R54-4PP) or non-contact eddy current systems (R54-EC).
Looking for OmniMap® RS-200 sheet resistance measurement tools for high-volume semiconductor chip manufacturing?
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Browse application notes and technical papers from KLA Instruments Application Engineers and customers, covering a variety of use cases for KLA Instruments products.
Timeline of Innovation
Our history of innovation and deep expertise have built a broad portfolio of measurement and inspection solutions that address every requirement and environment. See how it all started from the inception of the Alpha-Step® product line in 1977 through our latest product innovations.
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