The Voyager 1035 inspector with DefectWise® deep learning algorithm, separates key DOI (Defects Of Interest) from pattern nuisance defects to improve the overall defect capture rate of the defects that matter, including unique, subtle defects. Industry-unique oblique illumination and new sensors with a 30% improvement in quantum efficiency produce higher throughput and better sensitivity for lower dose inspection of delicate photoresist layers in applications such as after develop inspection (ADI) and photo cell monitoring (PCM) for EUV lithography.