KLA is proud to be a sponsor of the Karel Urbánek Best Student Paper Award at the SPIE Advanced Lithography + Patterning Conference. In addition to the sponsorship, we will have technical presentations. Our 24 papers with key partners will demonstrate how process control innovations help support advanced lithography and patterning.

SPIE Advanced Lithography + Patterning is the leading global lithography event. The latest advancements in optical lithography, metrology, and EUV will be discussed. Leaders attend the conference to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.